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ChemicalBook--->CAS DataBase List--->542-91-6

542-91-6

542-91-6 Structure

542-91-6 Structure
IdentificationMore
[Name]

DIETHYLSILANE
[CAS]

542-91-6
[Synonyms]

DIETHYLSILANE
Diethylsilanealso high purity
(C2H5)2SiH2
diethyl-silan
Silane, diethyl-
Diethylsilane,98+%
Diethylsilane,97%
Diethylsilane,highpuritymin99%
[EINECS(EC#)]

208-834-9
[Molecular Formula]

C4H12Si
[MDL Number]

MFCD00039877
[Molecular Weight]

88.22
[MOL File]

542-91-6.mol
Chemical PropertiesBack Directory
[Melting point ]

-132°C
[Boiling point ]

56 °C (lit.)
[density ]

0.681 g/mL at 25 °C(lit.)
[refractive index ]

n20/D 1.391(lit.)
[Fp ]

−20 °F
[storage temp. ]

under inert gas (nitrogen or Argon) at 2-8°C
[solubility ]

Miscible with terahydrofuran, diethyl ether, 1,4-dioxane and benzene.
[form ]

liquid
[Specific Gravity]

0.683
[Hydrolytic Sensitivity]

3: reacts with aqueous base
[Sensitive ]

Air Sensitive
[Merck ]

14,3128
[BRN ]

1730902
[CAS DataBase Reference]

542-91-6(CAS DataBase Reference)
[EPA Substance Registry System]

Silane, diethyl- (542-91-6)
Safety DataBack Directory
[Hazard Codes ]

F
[Risk Statements ]

R11:Highly Flammable.
[Safety Statements ]

S16:Keep away from sources of ignition-No smoking .
S23:Do not breathe gas/fumes/vapor/spray (appropriate wording to be specified by the manufacturer) .
S24/25:Avoid contact with skin and eyes .
[RIDADR ]

UN 1993 3/PG 2
[WGK Germany ]

1
[TSCA ]

Yes
[HazardClass ]

3
[PackingGroup ]

II
Questions And AnswerBack Directory
[Description]

Diethylsilane is a reagent used in the chemical vapor deposition of SiO2 for microelectronics. It is also used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It can also be used as a reductant in catalytic reduction of secondary amides to imines and secondary amines has been achieved using readily available iridium catalysts such as [Ir(COE)2Cl]2. This system requires low catalyst loading and shows high efficiency and an appreciable level of functional group tolerance. As a reduction agent, it also be used to convert polycarboxylic acids into their corresponding alkanes.
[Sources]

Levy, R. A., J. M. Grow, and G. S. Chakravarthy. "Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane." Cheminform 24.28(1993):851-854.
https://www.alfa.com/en/catalog/L16468/
https://www.sigmaaldrich.com/catalog/product/aldrich/423815?lang=en&region=US
https://pubs.acs.org/doi/full/10.1021/ja304547s#citing
Nimmagadda, Rama D., and C. Mcrae. Cheminform 37.35(2006):3505-3508.
Hazard InformationBack Directory
[Uses]

Diethylsilane is used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It is also used in the chemical vapor deposition of SiO2 for microelectronics.
[Application]

Used in the ‘in-situ’ preparation of diborane and haloboranes.
Well-known Reagent Company Product InformationBack Directory
[Alfa Aesar]

Diethylsilane, 98+%(542-91-6)
[Sigma Aldrich]

542-91-6(sigmaaldrich)
[TCI AMERICA]

Diethylsilane,>94.0%(GC)(542-91-6)
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