Tert-Butyl 4-Vinylphenyl Carbonate manufacturers
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| Tert-Butyl 4-Vinylphenyl Carbonate Basic information |
Product Name: | Tert-Butyl 4-Vinylphenyl Carbonate | Synonyms: | carbonicacid,1,1-dimethylethyl4-ethenylphenylester;p-tert-butoxycarbonyloxystyrenemonomer;tbsm;p-tert-Butoxycarbonyloxystyrene;TERT-BUTYL 4-VINYLPHENYL CARBONATE;TERT-BUTYL 4-VINYLPHENYL CARBONATE 98%;1,1-dimethylethyl4-ethenylphenylcarbonate;4-boc-styrene | CAS: | 87188-51-0 | MF: | C13H16O3 | MW: | 220.26 | EINECS: | | Product Categories: | | Mol File: | 87188-51-0.mol |  |
| Tert-Butyl 4-Vinylphenyl Carbonate Chemical Properties |
Melting point | 27-29 °C(lit.) | Boiling point | 187 °C(lit.) | density | 1.1101 (rough estimate) | refractive index | 1.5090 (estimate) | Fp | >230 °F | InChI | InChI=1S/C13H16O3/c1-5-10-6-8-11(9-7-10)15-12(14)16-13(2,3)4/h5-9H,1H2,2-4H3 | InChIKey | GJWMYLFHBXEWNZ-UHFFFAOYSA-N | SMILES | C(OC1=CC=C(C=C)C=C1)(=O)OC(C)(C)C | EPA Substance Registry System | Carbonic acid, 1,1-dimethylethyl 4-ethenylphenyl ester (87188-51-0) |
WGK Germany | 2 | RTECS | FG0460000 |
| Tert-Butyl 4-Vinylphenyl Carbonate Usage And Synthesis |
Uses | Used as an intermediate in organic synthesis. | Application |
Tert-Butyl 4-Vinylphenyl Carbonate (tBVPC) could be used to synthesize a terpolymer, which is a novel chemically amplified positive photoresist with methyl methacrylate (MMA)triphenylsulfonium salt methacrylate (TPSMA). In addition, Lithographic performance of a PAG-bound polymer resist based on tert-butyl 4-vinyl phenyl carbonate, n-[p-(t-butyloxycarbonyloxy) phenyl]maleimide terpolymers as a novel chemically amplified resist exhibited a positive working behavior. They showed 0.18 μm line pattern at electron beam lithography to indicate that the polymer bounded PAG resists have a potential to fabricate nanostructures[1].
| Hazard | Moderately toxic by skin contact. A mild
skin irritant. | Synthesis | Tert-Butyl 4-Vinylphenyl Carbonate was prepared by reacting 4-Hydroxystyrene with Di-tert-butyl dicarbonate in prestence of Tetramethylammonium hydroxide in water. | References | [1] Jae Beom Yoo . “Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography.” Polymer 55 16 (2014): Pages 3599-3604.
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| Tert-Butyl 4-Vinylphenyl Carbonate Preparation Products And Raw materials |
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