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TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) Struktur
CAS-Nr.
Englisch Name:
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
Synonyma:
TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS)
CBNumber:
CB2660187
Summenformel:
O5Ta2
Molgewicht:
441.8928
MOL-Datei:
Mol file

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) Eigenschaften

Sicherheit

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) Chemische Eigenschaften,Einsatz,Produktion Methoden

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) Upstream-Materialien And Downstream Produkte

Upstream-Materialien

Downstream Produkte

TANTALUM(V) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.9% (METALS BASIS) Anbieter Lieferant Produzent Hersteller Vertrieb H?ndler.

Global( 0)Lieferanten
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