| Identification | Back Directory | [Name]
TERT-BUTYL 4-VINYLPHENYL CARBONATE | [CAS]
87188-51-0 | [Synonyms]
tbsm
c-1566
4-boc-styrene
p-tert-Butoxycarbonyloxystyrene
4-(tert-Butoxycarbonyloxy)styrene
tert-Butyl p-vinylphenyl carbonate
TERT-BUTYL 4-VINYLPHENYL CARBONATE
p-tert-butoxycarbonyloxystyrenemonomer
TERT-BUTYL 4-VINYLPHENYL CARBONATE 98%
1,1-dimethylethyl4-ethenylphenylcarbonate
carbonicacid,1,1-dimethylethyl4-ethenylphenylester
4-(TERT-BUTOXYCARBONYLOXY)STYRENE;TERT-BUTYL P-VINYLPHENYL CARBONATE | [Molecular Formula]
C13H16O3 | [MDL Number]
MFCD00145182 | [MOL File]
87188-51-0.mol | [Molecular Weight]
220.26 |
| Hazard Information | Back Directory | [Hazard]
Moderately toxic by skin contact. A mild
skin irritant.
| [Uses]
Used as an intermediate in organic synthesis. | [Application]
Tert-Butyl 4-Vinylphenyl Carbonate (tBVPC) could be used to synthesize a terpolymer, which is a novel chemically amplified positive photoresist with methyl methacrylate (MMA)triphenylsulfonium salt methacrylate (TPSMA). In addition, Lithographic performance of a PAG-bound polymer resist based on tert-butyl 4-vinyl phenyl carbonate, n-[p-(t-butyloxycarbonyloxy) phenyl]maleimide terpolymers as a novel chemically amplified resist exhibited a positive working behavior. They showed 0.18 μm line pattern at electron beam lithography to indicate that the polymer bounded PAG resists have a potential to fabricate nanostructures[1].
| [Synthesis]
Tert-Butyl 4-Vinylphenyl Carbonate was prepared by reacting 4-Hydroxystyrene with Di-tert-butyl dicarbonate in prestence of Tetramethylammonium hydroxide in water. | [References]
[1] Jae Beom Yoo . “Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography.” Polymer 55 16 (2014): Pages 3599-3604.
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