Identification | Back Directory | [Name]
TITANIUM SILICIDE | [CAS]
12039-83-7 | [Synonyms]
TITANIUM SILICIDE Titanium disilicde Titanium disilicon TITANIUM DISILICIDE Titanium silicSIT8042.0 titaniumsilicide(tisi2) Titaniumsilicide(99+%-Ti) TITANIUM SILICIDE, POWDER TITANIUM SILICIDE -325 MESH Ti3C2Tx (MXene) several layer TITANIUM SILICIDE, 95%, powder Titanium disilicide powder (TiSi2) TITANIUM SILICIDE: 99.5%, -45 MICRON TITANIUM SILICIDE ISO 9001:2015 REACH Titaniumsilicidemicronpowderblackpowder Titanium silicide, 99.5% (metals basis) bis(λ2-silanylidene)titanium Titanium disilicide nanopowder, APS 20-30nm Titanium silicide, 99.5% trace metals basis Titanium silicide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick Titanium silicide sputtering target, 76.2mm (3.0 in.) dia. x 3.18mm (0.125 in.) thick Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis) Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis) | [EINECS(EC#)]
234-904-3 | [Molecular Formula]
Si2Ti | [MDL Number]
MFCD00151541 | [MOL File]
12039-83-7.mol | [Molecular Weight]
104.04 |
Chemical Properties | Back Directory | [Melting point ]
1540°C | [Boiling point ]
1540°C | [density ]
4,39 g/cm3 | [RTECS ]
XR2420000 | [solubility ]
insoluble in H2O, acid solutions, alkaline solutions; soluble in HF | [form ]
Powder | [color ]
Gray | [Resistivity]
123 (ρ/μΩ.cm) | [Water Solubility ]
Soluble in hydrofluoric acid. Insoluble in water. | [Crystal Structure]
Orthorhombic | [EPA Substance Registry System]
Titanium silicide (TiSi2) (12039-83-7) |
Hazard Information | Back Directory | [Chemical Properties]
orthorhombic black powder(s), a=0.8236 nm, b=0.4773nm, c=0.8523 nm; hardness 4.5 Mohs; resistivity 123μοhm· cm can be prepared by reaction of the elements; used in special alloy applications, as a flame-resistant coating material, also as 99.5 or 99.9% pure material, as a sputtering target in the fabrication of integrated circuits [HAW93] [STR93] [CER91] | [Uses]
In special alloy applications, as a flame or blast
impingement-resistant coating material. | [Synthesis]
(1) PREPARATION FROM THE ELEMENTS Ti + 2 Si = TiSi2 The silicides are prepared by fusing or sintering intimate
stoichiometric mixtures of the elements (in powder form). The
reaction is carried out in sintered clay or ceramic crucibles,
placed in a Tammann furnace under a blanket of Ar. In all three
cases the reaction takes place at a relatively low temperature and
is highly exothermic; therefore, one should work with gram quantities only. (2) ALUMINOTHERMIC METHOD Ignition of a mixture of, for example, 200 g. of Al powder, 250 g.
of S, 180 g. of SiOa and 15 g. of TiO2 (or 40 g. of K2TiF6 ), covered
with a thin layer of Mg, yields an ingot containing, in addition to Si
and Al, small, iron-gray tetragonal pyramids of TiSi2 . (3) ELECTROLYTIC PREPARATION The pure, crystalline silicides ar e obtained by melt electrolysis
of a mixture of, for example, 10K2SiF6
+ TiO2 at about 900°C, using
an iron cathode; alternately, electrolysis of TiO2
dissolved in a
melt of silicate may be used.
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Company Name: |
Alfa Aesar
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400-6106006 |
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Company Name: |
Energy Chemical
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Company Name: |
Spectrum Chemical Manufacturing Corp.
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www.spectrumchemical.com/oa_html/index.jsp?minisite=10020&respid=22372&language=us |
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